Component Management

Coating reduces contaminants shed by graphite parts

26th March 2015
Jordan Mulcare
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Morgan Advanced Materials’ Specialty Graphite business is helping customers within the semiconductor industry to operate in challenging environments with its Glassy Carbon Impregnation and Glassy Carbon Coating for custom-machined pure graphite products. Both options significantly reduce contaminants that can be shed by graphite parts.

The coated or impregnated parts are ideal for use in the semiconductor industry, particularly in ion implantation machines, where contamination must be tightly controlled despite extreme temperatures and vacuum conditions. They are also an excellent choice for precious metals processing, where they extend tool and die life in continuous casting and press and mold casting processes.

Morgan’s Glassy Carbon Impregnation penetrates and seals the graphite substrate to approximately 0.25-inch (6.35mm). The Glassy Carbon Coating provides an even greater seal, leading to even fewer particulates shed. In parts placed near chipsets in ion implantation machines or in other highly sensitive areas, the high purity and low contamination risk provided by the Glassy Carbon Coating can have a significant impact on the success of operations.

Specialty Graphite is a business of Morgan Advanced Materials which manufactures a variety of extruded and isostatically moulded graphite grades that can be machined and purified to custom specifications. Our purification capabilities in conjunction with glassy carbon coatings and impregnation result in some of the leading graphite products currently available in the industry.

Our products include continuous casting dies for casting non-ferrous alloys, precious metals and grey iron in the metallurgical industry and component handling trays for use in high temperature environments such as furnaces.

Fine grained high purity graphite from Morgan Advanced Materials is often combined with a glassy coating or impregnation for use in high tech applications such ion implantation and plasma etching equipment in semiconductor production.

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