'Ultra clean' filter for semiconductor manufacturing

9th July 2014
Source: Entegris
Posted By : Siobhan O'Gorman

An 'ultra clean' liquid filtration solution for use in the semiconductor manufacturing process has been released by Entegris. The Torrento X Series is the first commercial, non-dewetting, all PTFE filter with 10 nm particle retention for advanced wet etch and clean applications.

The series filters facilitate 'drop-in replacement' of new or existing filters, enabling greater installation flexibility and reducing overall operational costs. The field-proven high-flux membrane filter comes standard with ultra-low metallic cleanliness technology (UCM) to minimise the most challenging contaminants in advanced semiconductor fabs. Entegris also offers an Extreme-Ultra Clean Membrane (X-UCM) option with a higher level of cleanliness compared to any prior generation of PTFE filters with faster start up times and superior retention ratings.

"As the industry ramps to sub-2X nm manufacturing processes, enhanced cleanliness requirements have become a necessity to reduce particle defectivity and minimise metal contaminants that impact wafer yields," said Todd Edlund, Senior Vice President, General Manager of Entegris' Critical Materials Handling Business. "Our new Torrento filter can enable integrated device manufactures to efficiently scale-up and produce more advanced devices."


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