'Ultra clean' filter for semiconductor manufacturing

The series filters facilitate 'drop-in replacement' of new or existing filters, enabling greater installation flexibility and reducing overall operational costs. The field-proven high-flux membrane filter comes standard with ultra-low metallic cleanliness technology (UCM) to minimise the most challenging contaminants in advanced semiconductor fabs. Entegris also offers an Extreme-Ultra Clean Membrane (X-UCM) option with a higher level of cleanliness compared to any prior generation of PTFE filters with faster start up times and superior retention ratings.

"As the industry ramps to sub-2X nm manufacturing processes, enhanced cleanliness requirements have become a necessity to reduce particle defectivity and minimise metal contaminants that impact wafer yields," said Todd Edlund, Senior Vice President, General Manager of Entegris' Critical Materials Handling Business. "Our new Torrento filter can enable integrated device manufactures to efficiently scale-up and produce more advanced devices."